Influences of working pressure on properties for TiO2 films deposited by DCpulse magnetron sputtering
ZHANG Can
,
ZHANG Can
X
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Affiliations
- 1. Institute of Optoelectronic Materials and Device, Dalian Jiaotong University, Dalian 116028, China. Email: king524525@yahoo.cn
2. School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China
DING Wanyu
,
DING Wanyu
X
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Affiliations
- 1. Institute of Optoelectronic Materials and Device, Dalian Jiaotong University, Dalian 116028, China. Email: king524525@yahoo.cn
2. School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China
WANG Hualin
,
WANG Hualin
X
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Affiliations
- 1. Institute of Optoelectronic Materials and Device, Dalian Jiaotong University, Dalian 116028, China. Email: king524525@yahoo.cn
2. School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China
CHAI Weiping
,
CHAI Weiping
X
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Affiliations
- 1. Institute of Optoelectronic Materials and Device, Dalian Jiaotong University, Dalian 116028, China. Email: king524525@yahoo.cn
2. School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China
JU Dongying
DOI:
Received ,Revised , Accepted , Available online
Volume 21,2009,Pages 741-744